Tips for Water Processing Photoresist Film

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First, note that image development and drying are not necessary with advanced dry-processing photoresist films.

Water processing photoresist film can be washed out at water temperatures up to 120 F at 50 to 1250 psi. Washout can range anywhere from 20 seconds to two minutes depending on the thickness of the film and the detail of the artwork.

Warm water and high pressure are recommended to increase production and decrease the washout time. Use a gentle, steady sweeping motion from about 6″-12″ away from the photoresist film.

Michael Sullican IKONICS Imaging

Michael Sullivan

Michael Sullivan was previously the marketing manager for IKONICS Corporation.

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